发明名称 |
Method of simultaneously etching waveguides and intersecting trenches for a switching matrix application |
摘要 |
A method of fabricating an optical waveguide device that includes a waveguide and a trench, comprises providing a substrate material that includes a substrate layer, an underclad layer, a core layer, and an overclad layer. A waveguide and trench pattern is simultaneously defined in the substrate material and the substrate material is etched to form a waveguide circuit structure that includes the waveguide and trench pattern. Thus, the waveguide and the trench are self-aligned. The trenches can house moveable mirrors and/or index-matching fluid in order to work as a switch. <IMAGE> |
申请公布号 |
EP1191373(A1) |
申请公布日期 |
2002.03.27 |
申请号 |
EP20000402597 |
申请日期 |
2000.09.20 |
申请人 |
CORNING INCORPORATED |
发明人 |
GUILHEM, JEAN-MARIE ALIBERT;BEGUIN, ALAIN MARCEL;JOUANNO, JEAN-MARC MARTIN;LEHUEDE, PHILIPPE;RENVAZE, CHRISTOPHE FRANCOIS PIERRE |
分类号 |
G02B6/12;G02B6/122;G02B6/35;G02B6/36;G02B26/02 |
主分类号 |
G02B6/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|