发明名称 Method of simultaneously etching waveguides and intersecting trenches for a switching matrix application
摘要 A method of fabricating an optical waveguide device that includes a waveguide and a trench, comprises providing a substrate material that includes a substrate layer, an underclad layer, a core layer, and an overclad layer. A waveguide and trench pattern is simultaneously defined in the substrate material and the substrate material is etched to form a waveguide circuit structure that includes the waveguide and trench pattern. Thus, the waveguide and the trench are self-aligned. The trenches can house moveable mirrors and/or index-matching fluid in order to work as a switch. <IMAGE>
申请公布号 EP1191373(A1) 申请公布日期 2002.03.27
申请号 EP20000402597 申请日期 2000.09.20
申请人 CORNING INCORPORATED 发明人 GUILHEM, JEAN-MARIE ALIBERT;BEGUIN, ALAIN MARCEL;JOUANNO, JEAN-MARC MARTIN;LEHUEDE, PHILIPPE;RENVAZE, CHRISTOPHE FRANCOIS PIERRE
分类号 G02B6/12;G02B6/122;G02B6/35;G02B6/36;G02B26/02 主分类号 G02B6/12
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