发明名称 DEFECT ANALYSIS SYSTEM
摘要 PROBLEM TO BE SOLVED: To efficiently sort inspected objects having new defects hard to solve by conventional knowledge, out of a large number of objects to be inspected. SOLUTION: This analysis system for defects detected in a plurality of objects to be inspected has an appearance inspection device 100 for detecting defective parts in the inspected objects; a defect classifying device 200 for detecting detailed information in the defective parts and classifying the defects into known defects whose appearance is confirmed, and new defects whose appearance is not confirmed; and a defect analysis device 300 for accepting the assignment of the inspected objects and analyzing the assigned inspected objects. The appearance inspection device 100, the defect classifying device 200 and the defect analysis device 300 can have display devices for displaying the number of defects every classification including the new defects.
申请公布号 JP2002090312(A) 申请公布日期 2002.03.27
申请号 JP20000287081 申请日期 2000.09.21
申请人 HITACHI LTD 发明人 SHIMODA ATSUSHI;ISHIMARU ICHIRO;TAKAGI YUJI;OBARA KENJI;NAKAGAKI AKIRA;WATANABE KENJI
分类号 G01N21/956;G01N1/28;G01N1/32;G01N33/00;G01N35/00;G06T1/00;H01L21/66 主分类号 G01N21/956
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