| 摘要 |
PROBLEM TO BE SOLVED: To provide a negative type electron beam or X-ray resist composition having high sensitivity and high resolving power, capable of giving pattern profile with superior rectangularity and excellent in PCD and PED stability. SOLUTION: The chemical amplification type negative type resist composition for electron beams and/or X-rays contains (A) an alkali-soluble resin containing at least one selected from the group comprising polyvinylphenols having partially alkyl-etherified, aryl-etherified, alkenyl-etherified or aralkyl-etherified phenolic hydroxyl groups and hydrogenated polyvinylphenols having partially alkyl- etherified, aryl-etherified, alkenyl-etherified or aralkyl-etherified phenolic hydroxyl groups, (B) a compound which generates an acid when irradiated with electron beams or X-rays, (C) a crosslinker which causes crosslinking under the acid and (D) a nitrogen-containing compound having at least one specified structure in one molecule. |
