| 摘要 |
An electrochemical deposition system comprising a fixture adapted to selectively grasp and release an electrochemical process cell is provided. The system may include a lift/lower mechanism coupled to the fixture and adapted to automatically stop lowering the fixture at a process cell elevation, a rotation mechanism coupled to the fixture and adapted to automatically stop rotating the fixture when aligned with a process cell location and when aligned with a process cell exchange location. The fixture adapted to selectively grasp and release an object to be lifted may include a cam/follower coupling between a rotatable portion of the fixture and a gripping portion of the fixture. To grasp a process cell with the fixture, the rotating portion of the fixture may be rotated so as to retract the gripping portion of the fixture causing the gripping portion to close around the process cell.
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