发明名称 Utility wafer for chemical mechanical polishing
摘要 A utility wafer, more specifically, an utility wafer for simulating a workpiece in a semiconductor processing system. The utility wafer includes a first side, a second side and a peripheral edge wherein one or both edges of the peripheral edge are relieved to remove the otherwise sharp edge. In one embodiment, the peripheral edge is polished. The utility wafer is resistant to chipping, stress cracking and breakage when undergoing chemical mechanical planarization.
申请公布号 US6361405(B1) 申请公布日期 2002.03.26
申请号 US20000544734 申请日期 2000.04.06
申请人 APPLIED MATERIALS, INC. 发明人 DAVID JEFFREY D.;BONNER BENJAMIN A.;OSTERHELD THOMAS H.;HUEY SIDNEY
分类号 B23K26/00;B24B37/04;(IPC1-7):B24B1/00 主分类号 B23K26/00
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