METHOD AND DEVICE FOR PLASMA TREATMENT

摘要

PROBLEM TO BE SOLVED: To provide a method and a device for supplying a gas, which reduces fling-up of dusting when the gas is supplied and in which contamination of a work to be worked. SOLUTION: At the start of supply of the gas, a signal for fully closing a gas flow rate control valve 12 being a constitutive component of a massflow controller 3 is inputted to a control circuit 11, and then the gas flow amount control valve 12 is fully closed. Thereafter, a primary valve 1 and a secondary valve 2 are fully opened.