发明名称 Process of forming deposited film, process of producing semiconductor element substrate, and process of producing photovoltaic element
摘要 The present invention provides a process of forming a deposited film on a belt-like substrate by a roll-to-roll system, the process comprising the step of eliminating a curl deformation of the belt-like substrate resulting from application of a deformation stress, by exerting an external stress on a non-depositing surface of the belt-like substrate. It can prevent occurrence of flaws, defects of appearance, defects of electrode, and so on in succeeding steps etc. and can produce semiconductor elements and photovoltaic elements with high quality at a high yield.
申请公布号 US6362020(B1) 申请公布日期 2002.03.26
申请号 US19990238572 申请日期 1999.01.28
申请人 CANON KABUSHIKI KAISHA 发明人 SHIMODA HIROSHI;SAITO KEISHI
分类号 H01L31/0392;H01L31/052;H01L31/075;H01L31/20;(IPC1-7):H01L21/00 主分类号 H01L31/0392
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