发明名称 |
Method for preparing high temperature superconductor |
摘要 |
A method of depositing a biaxially textured metal oxide on a substrate defining a plane in which metal oxide atoms are vaporized from a source to form a plume of metal oxide atoms. Atoms in the plume disposed at a selected angle in a predetermined range of angles to the plane of the substrate are allowed to contact the substrate while preventing atoms outside a selected angle from reaching the substrate. The preferred range of angles is 40°-70° and the preferred angle is 60°±5°. A moving substrate is disclosed.
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申请公布号 |
US6361598(B1) |
申请公布日期 |
2002.03.26 |
申请号 |
US20000621272 |
申请日期 |
2000.07.20 |
申请人 |
THE UNIVERSITY OF CHICAGO |
发明人 |
BALACHANDRAN UTHAMALINGAM;CHUDZIK MICHAEL P. |
分类号 |
C30B23/02;H01L39/24;(IPC1-7):C30B25/02 |
主分类号 |
C30B23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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