| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad having good slurry holding characteristics, capable of performing a uniform polishing operation, and excellent in the resistance against chemicals. SOLUTION: The polishing pad consists of a porous body with open cells formed from polyimide resin, wherein it is preferable that the open-cell porous body does not have any dense layer at the surface obtained by the wet type solidification method. |
