发明名称 |
LIQUID PROCESSING EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide liquid processing equipment capable of stably moving a discharge nozzle to a uniaxial direction and uniformly feeding a processing liquid to a substrate. SOLUTION: The liquid processing equipment, e.g. a development processing unit (DEV) 24a-24c being one form thereof is provided with a retaining means such as a spin chuck 41 on which a base plate G is placed and retained; a paddle formation nozzle 80 for discharging a predetermined developer onto a surface of the base plate G retained by the spin chuck; a nozzle retaining arm 51 for retaining the paddle formation nozzle 80; and guide rails 53a, 53b arranged in parallel so as to engage with the nozzle retaining arm 51 near a longitudinal end of the nozzle retaining arm 51. The nozzle retaining arm 51 is moved to the longitudinal direction along the surface of the base plate G retained by the spin chuck 41. |
申请公布号 |
JP2002086039(A) |
申请公布日期 |
2002.03.26 |
申请号 |
JP20000277632 |
申请日期 |
2000.09.13 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
YAMAZAKI TAKESHI;YUZUHARA KAZUNORI;NAKAMITSU TAKASHI;MIYAZAKI KAZUHITO;SAKAI MITSUHIRO;AOKI MASAYA |
分类号 |
G03F7/30;B05C5/00;B05C9/00;B05C11/08;B05D1/40;B05D7/00;H01L21/00;H01L21/027;H01L21/304;H01L21/306;(IPC1-7):B05C5/00 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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