发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device having good characteristics and a high reliability and its manufacturing method which improves the crack resistance of a resin layer for stably holding inner leads forming a fine wiring pattern in a resin sealed semiconductor device having a UFPL structure. SOLUTION: A first and second IC chips 26a, 26b are adhered through an insulation paste 28 onto the surfaces of inner leads 24 and a liquid crystal polymer layer 20 around them, electrodes of these IC chips 26a, 26b are connected to the surfaces of the inner leads 24 forming the fine wiring pattern through Au wires 30, and the whole of them is sealed with a mold resin 32 to manufacture a resin sealed UFPL-structured semiconductor device. The backsides and the side faces of the inner leads forming the fine wiring pattern are covered with the liquid crystal polymer layer 20 having a far superior water absorption dimensional stability to the conventionally used polyimide layer, thereby reinforcing them.
申请公布号 JP2002083919(A) 申请公布日期 2002.03.22
申请号 JP20000271558 申请日期 2000.09.07
申请人 SONY CORP 发明人 MAKINO HARUHIKO;IWASHITA TAKESHI;KUSANO HIDETOSHI
分类号 H01L21/60;H01L23/50;(IPC1-7):H01L23/50 主分类号 H01L21/60
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