| 摘要 |
<p>PROBLEM TO BE SOLVED: To smoothly, efficiently and further highly accurately laminate and form plural kinds of films, without enlarging or extending a filming chamber. SOLUTION: In the device for laminating plural kinds of films by plasma CVD, this device is provided with both low-speed filming chambers 1a, 1b, 7a and 7b for housing the plasma CVD system of low-filming speed and a high- speed filming chamber 4 for housing the plasma CVD system of high-filming speed. Between the low-speed filming chambers and the high-speed filming chamber, pressure regulating chambers 2a, 2b, 6a and 6b are interposed so that a substrate can move from any of the low-speed filming chambers and the high-speed filming chamber through the pressure regulating chamber to the other filming chamber.</p> |
