发明名称 |
Determination of center of focus by diffraction signature analysis |
摘要 |
Methods for determination of parameters in lithographic devices and applications by diffraction signature difference analysis, including determination of center of focus in lithography devices and applications. Latent image analysis may be employed with exposed but undeveloped lithographic substrates. Control methods are provided for process control of center of focus in lithography devices utilizing diffraction signature difference analysis. |
申请公布号 |
AU1295802(A) |
申请公布日期 |
2002.03.22 |
申请号 |
AU20020012958 |
申请日期 |
2001.09.05 |
申请人 |
ACCENT OPTICAL TECHNOLOGIES, INC. |
发明人 |
MICHAEL EUGENE LITTAU;CHRISTOPHER J. RAYMOND |
分类号 |
G01M11/02;G03F7/20;H01L21/027 |
主分类号 |
G01M11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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