| 摘要 |
PROBLEM TO BE SOLVED: To suppress and prevent the formation of a projecting part formed on the surface of a substrate caused by the impurities contained in water/and the atmosphere used in a cleaning and a drying stages and containing at least one of C, O, Al, Si, Fe, Cu, Zn and Zr. SOLUTION: In a method for manufacturing the substrate for an information recording medium, having a cleaning and a drying stages for cleaning and drying the substrate for the information recording medium which is precisely polished, the correlation between a contact angle of water on the surface of the substrate before the cleaning and the drying stages and the size (height) of the projecting part adhered to the surface of the substrate obtained after the cleaning and the drying stages is previously found and the contact angle of water on the surface of the substrate before the cleaning and the drying stages is controlled so that the projecting part has such a size (height) that no product defect is generated.
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