| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material which suppresses the sticking of dust and foreign matter causing void and spot defects after heat development in a heat developable photosensitive material excellent in heat developability and image preservability. SOLUTION: In the heat developable photosensitive material containing at least one photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions and a binder on one face of the base, a surfactant of the formula [Rf-(Rc)n]m-Z [where Rf is a perfluoroalkyl; Rc is an alkylene; Z is a group having an anionic group, a cationic group, a betaine group or a nonionic polar group required to impart surface activity; (n) is an integer of 0 or 1; and (m) is an integer of 1-3].
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