发明名称 PHOTOSENSITIZER AND VISIBLE LIGHT PHOTOCURING RESIN COMPOSITION USING THE PHOTOSENSITIZER AND ITS USAGE
摘要 PROBLEM TO BE SOLVED: To provide a visible light sensitive resin composition having enough sensitivity to visible light region, especially, to second harmonics of He-Cd laser, argon laser, and YAG laser, excellent in storage stability, and capable of forming an excellent photosensitive layer for a visible light laser. SOLUTION: This photosensitizer contains at least an indolizine compound represented by formula (1) (wherein ring A represents an indolizine ring which may have a substituent, and X, Y, and Z show the meaning shown in the detailed description of the patent), and this visible light curing resin composition contains the photosensitizer.
申请公布号 JP2002080821(A) 申请公布日期 2002.03.22
申请号 JP20000268489 申请日期 2000.09.05
申请人 MITSUI CHEMICALS INC 发明人 OGISO AKIRA;NAKAGAWA SHINICHI;KIYONO KAZUHIRO;MISAWA TSUTAYOSHI;SHIMAMURA TAKEHIKO
分类号 G03F7/004;C07D491/147;C08F2/50;C09B57/00;C09K3/00;G03F7/00;G03F7/028 主分类号 G03F7/004
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