PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION, METHOD FOR PRODUCING PATTERN USING THE SAME, AND ELECTRONIC PARTS

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive polyimide precursor resin composition having high sensitivity and high resolution, a method for producing pattern using the composition, and electronic parts. SOLUTION: The photosensitive polyimide precursor composition contains (A) a polyimide precursor having repeating units of formula (I) (where R1 is a tetravalent organic group; R2 is a di-, tri- of tetravalent organic group; each R3 is a monovalent organic group of formula (II-1) or (II-2) (where X is an integer of 3-20; Y and R are each H or CH3; and Z is an integer of 2-10) or H, at least one R3 is such a monovalent organic group; A is a monovalent group exhibiting acidity; and (n) is 0, 1 or 2) and (B) a photopolymerization initiator.