| 摘要 |
PURPOSE: An exposure apparatus is provided to improve a photo process margin by installing an aperture for removing a reflective beam in an illuminating system so that the aperture prevents the light reflected from a projection lens, and to prevent illuminating power from being decreased by eliminating only flare noise. CONSTITUTION: The illuminating system(31) has a beam cell projecting aperture, positioned on an irradiation target layer. A reticle(35) functions as a mask for forming a pattern, positioned between the illuminating system and the irradiation target layer. The projection lens(34) collects and filters the beam irradiated from the illuminating system, positioned between the reticle and the irradiation target layer. The aperture(32) for removing the reflective beam removes the beam reflected from the projection lens, having the same shape as the beam cell projecting aperture in the illuminating system.
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