CLEANING METHOD AND CLEANING DEVICE FOR PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a cleaning method and cleaning device for photomask which effectively remove the foreign matter existing on a photomask. SOLUTION: This cleaning method for photomask consists of irradiating a photomask with UV light for a specified time by using a UV irradiation device of 170 to 180 nm in wavelength of >=90% of the total generated UV light, then cleaning this photomask by using an alkaline cleaning liquid.