| 摘要 |
PROBLEM TO BE SOLVED: To provide a method capable of manufacturing polishing pad, composed of a hard resin plate, with which independent bubbles exist uniformly, comparatively easily and further with high quality reproducibility. SOLUTION: In the manufacturing method for polishing pad, the resin plate, with which monomers are impregnated, is polymerized and hardened in a state of covering the front layer of this resin plate with a polymer and/or monomer- containing solution. |
