| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a recovery apparatus for abrasives, with which the meshes of the film of a film separator is prevented from being clogged, the frequency of film exchange is decreased, the running cost of an apparatus is reduced and the apparatus can be stably operated for a long time, concerning the apparatus for efficiently collecting and recycling abrasive particles from the waste water of polishing process containing abrasives or the like discharged from a chemical mechanical polishing(CMP) process to be used for a semiconductor production plant. SOLUTION: In the collector for abrasives for collecting abrasives from the waste water of polishing process, this device has a first film-separating means for introducing and condensing the waste water of polishing process and a second film-separating means for introducing the condensed liquid separated by the first film-separating means and removing coarse solids in the condensed liquid.</p> |
