发明名称 CARRYING MECHANISM OF SEMICONDUCTOR COMPONENT
摘要 PROBLEM TO BE SOLVED: To provide a carrying mechanism of a semiconductor component wherein the semiconductor component can be prevented from damaging due to the generation of a discharge during its carriage. SOLUTION: In the carrying mechanism, a Raydent processing film 10 is formed in the inner surface of a carrying rail 1 opposed to leads 7, and the quality of the sealing resin material of a semiconductor component 6 is set selectively to the one hard to generate the frictional static electricity between the Raydent processing film 10 and it. Even when a discharge is generated between the lead 7 and the film 10 by the lead 7 approaching the film 10, a charge charged in a capacitor C of an electrostatic capacitor system is zero at t=0 and approaches Q=CE along a relaxed time slope dependent on 1/(CRl). Therefore, the leading edge of the discharging waveshape is relaxed to suppress the rapid increase of the discharge current. As a result, the energy of the discharge is decreased to make preventable the damage of the lead 7 caused by the electrostatic discharge. Further, by the high lubricating ability of the Raydent processing film 10, there is reduced the side run-out of the semiconductor component 6 which is generated on a rail main body 5 during the component 6 sliding on the rail 1. Moreover, the effect of preventing the portion of the lead 7 from damaging due to the electrostatic discharge is improved to make possible the miniaturization of the whole of the carrying mechanism.
申请公布号 JP2002083826(A) 申请公布日期 2002.03.22
申请号 JP20000269235 申请日期 2000.09.05
申请人 SONY CORP 发明人 OKAMOTO TORU
分类号 H01L21/50;(IPC1-7):H01L21/50 主分类号 H01L21/50
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