| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device, which has a mechanism for scanning light beam from a light source to a prescribed direction and an optical system, for introducing the light beam scanned by the scanning mechanism to the surface of a photosensitive material, and in which the optical system has a pair of return mirrors having translucent media and first reflecting surfaces formed at these media and the light beams reflected by the first reflecting surfaces of the respective return mirrors form a main optical path which advances symmetrically with respect to one virtual plane and with which defects such as bands hardly occur in the images obtained on the photosensitive material. SOLUTION: This device is provided with a means for regulating the overlapping of the sub-optical paths BS, Bs1 and Bs2 formed by the light beams, which are emitted from the scanning mechanism 4 and are made incident on the inside of the media from the first reflecting surfaces P1 of the return mirrors 54a, 56a and 58a on the upstream side on the main optical path BM.
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