发明名称 NEGATIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION AND METHOD OF FORMING IMAGE FROM THE SAME
摘要 <p>A negative photosensitive polyimide composition which is soluble in organic solvents, is excellent in adhesion, heat resistance, mechanical properties, and flexibility, and gives a highly sensitive negative photoresist which becomes alkali-soluble upon light irradiation. The composition comprises a photo-radical generator and a solvent-soluble polyimide showing negative photosensitivity in the presence of either an olefin or the photo-radical generator.</p>
申请公布号 WO2002023276(P1) 申请公布日期 2002.03.21
申请号 JP2001007876 申请日期 2001.09.11
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址