发明名称 ELECTRON MICROSCOPE
摘要 Relationship among an exciting current of each lens of an irradiation lens system including at least two stages of irradiation lenses and an electron beam aperture, an irradiation electron beam density on a sample and an area of the sample surface irradiated with an electron beam is stored in a form of a table or equations, and an exciting condition of each of the lenses of the irradiation lens system is retrieved from the relationship and set the irradiation lens system to the retrieved condition, for example, when the enlarging magnification is changed under a condition of keeping the irradiation electron beam density at a constant value. Further, trails of a region of the sample surface irradiated with the electron beam is displayed on a display unit.
申请公布号 US2002033451(A1) 申请公布日期 2002.03.21
申请号 US19980182356 申请日期 1998.10.29
申请人 NAGAOKI ISAO;KOBAYASHI HIROYUKI;YOTSUJI TAKAFUMI 发明人 NAGAOKI ISAO;KOBAYASHI HIROYUKI;YOTSUJI TAKAFUMI
分类号 H01J37/04;G01N23/04;G21K7/00;H01J37/21;H01J37/26;(IPC1-7):G21K7/00;G01N23/00 主分类号 H01J37/04
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