发明名称 |
Novel ester compounds having alicyclic and oxirane structures and method for preparing the same |
摘要 |
An ester compound of formula (1) is provided. R1 is H or methyl, R2 is tertiary C4-20 alkyl, and k=0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance and substrate adhesion, and is suited for micropatterning using electron beams or deep-UV.
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申请公布号 |
US2002035279(A1) |
申请公布日期 |
2002.03.21 |
申请号 |
US20010873193 |
申请日期 |
2001.06.05 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
WATANABE TAKERU;KINSHO TAKESHI;HASEGAWA KOJI;NISHI TSUNEHIRO;NAKASHIMA MUTSUO;TACHIBANA SEIICHIRO;HATAKEYAMA JUN |
分类号 |
C07B61/00;C07D301/02;C07D303/48;C08F32/08;C08G65/22;G03F7/039;H01L21/027;(IPC1-7):C0733/40 |
主分类号 |
C07B61/00 |
代理机构 |
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代理人 |
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地址 |
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