发明名称 |
Cerium oxide slurry for polishing, process for preparing the slurry, and process for polishing with the slurry |
摘要 |
A cerium oxide slurry for polishing comprising cerium oxide dispersed in water, wherein the slurry has a conductivity of about 30c muS/cm or less when the cerium oxide concentration in the slurry is c wt.%. In order to adjust the conductivity to about 30c muS/cm or less, cerium oxide is washed with deionized water. |
申请公布号 |
US2002032989(A1) |
申请公布日期 |
2002.03.21 |
申请号 |
US20010968846 |
申请日期 |
2001.10.03 |
申请人 |
SHOWA DENKO K.K. |
发明人 |
KIDO TAKANORI;SANBAYASHI MASAYUKI;TSUJINO FUMIO;ICHIKAWA KAGETAKA |
分类号 |
B24B37/00;C09C1/68;C09G1/02;C09K3/14;H01L21/304;H01L21/306;(IPC1-7):C09C1/68 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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