| 摘要 |
<p>An electron beam passed through a mask (1) is sensed using a sensor (9) comprising a plurality of elements arranged in a plurality of lines, and an image signal is transferred on the sensor in synchronism with the movement of the mask, thus realizing high resolution, high speed mask inspection using an electron beam. For pixels along the line of the sensor, simultaneous sensing is conducted, and image signal are transferred synchronously in the direction perpendicular to the line, thus inspecting the mask at high speed with high resolution. An image can be generated with an extremely high accuracy by linear scanning with no zig-zag scanning using a stage (2) of simple structure.</p> |
