| 摘要 |
<p>In one embodiment of the present invention, an integral lid assembly (10) for sealing a substrate processing chamber includes first (16) and third (12) plates fixedly fused to a second plate (14) positioned therebetween. The first and second plates define a coolant passage (110) or channel therein, and the second and third plates define a gas delivery channel(s) (146, 148) therein. The first plate has a substantially planar surface for coupling to a processing chamber, and the third plate has a substantially planar surface for coupling to a microwave generation device or a remote plasma clean device (106). In this manner, the lid assembly is compact in size, and facilitates the mounting of a microwave device closer to the chamber than for bulkier lid assemblies. In another embodiment, gas passages (232) through the brazed lid assembly (200) are coupled to the processing chamber (310), and are configured to provide the desired gas distribution thereto for exemplary processes.</p> |
