发明名称 Method of and device for simulation
摘要 A method of and device for simulation which represents variations in electrical characteristics (Idsat, Vth and the like) of a device constituting a semiconductor integrated circuit in the form of a corner model including corners defining the limits of the variations is provided. A circuit simulation is performed to determine device parameter sensitivities which are the derivatives of the electrical characteristics with respect to device parameters such as DELTAL, DELTAW, Tox and Vth0. Variations in the device parameters at each corner are determined by applying the device parameter sensitivities and the values of the electrical characteristics required for each corner to the normal equation of the linear least squares method. The method and device can determine the values of a set of device parameters at each corner without the need to repeat the circuit simulation and can uniquely determine the values of the set of device parameters.
申请公布号 US2002035462(A1) 申请公布日期 2002.03.21
申请号 US20000740901 申请日期 2000.12.21
申请人 KIDERA MAKOTO;TANIZAWA MOTOAKI 发明人 KIDERA MAKOTO;TANIZAWA MOTOAKI
分类号 G01R31/28;G06F17/50;H01L21/00;H01L21/82;H01L21/822;H01L27/04;(IPC1-7):G06F17/50 主分类号 G01R31/28
代理机构 代理人
主权项
地址