Process control method e.g. for semiconductor disc or wafer manufacture has readiness point for each successive process sequence step provided in dependence on start point of preceding step

摘要

The process control method has a readiness point for each successive step in a process sequence provided in dependence on the start time for the preceding process sequence step, so that the end time of the preceding step coincides with the start time of the following step. The readiness command for the following step is provided upon reaching a given time point after the start of the preceding step. An Independent claim for a process control device is also included.