发明名称 NEGATIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION AND METHOD OF FORMING IMAGE FROM THE SAME
摘要 <p>A negative photosensitive polyimide composition which is soluble in organic solvents, is excellent in adhesion, heat resistance, mechanical properties, and flexibility, and gives a highly sensitive negative photoresist which becomes alkali-soluble upon light irradiation. The composition comprises a photo-radical generator and a solvent-soluble polyimide showing negative photosensitivity in the presence of either an olefin or the photo-radical generator.</p>
申请公布号 WO0223276(A1) 申请公布日期 2002.03.21
申请号 WO2001JP07876 申请日期 2001.09.11
申请人 PI R &amp, D CO., LTD.;ITATANI, HIROSHI;MATSUMOTO, SHUNICHI 发明人 ITATANI, HIROSHI;MATSUMOTO, SHUNICHI
分类号 C08L79/08;G03F7/037;G03F7/038;(IPC1-7):G03F7/038;G03F7/004 主分类号 C08L79/08
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