发明名称 |
NEGATIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION AND METHOD OF FORMING IMAGE FROM THE SAME |
摘要 |
<p>A negative photosensitive polyimide composition which is soluble in organic solvents, is excellent in adhesion, heat resistance, mechanical properties, and flexibility, and gives a highly sensitive negative photoresist which becomes alkali-soluble upon light irradiation. The composition comprises a photo-radical generator and a solvent-soluble polyimide showing negative photosensitivity in the presence of either an olefin or the photo-radical generator.</p> |
申请公布号 |
WO0223276(A1) |
申请公布日期 |
2002.03.21 |
申请号 |
WO2001JP07876 |
申请日期 |
2001.09.11 |
申请人 |
PI R &, D CO., LTD.;ITATANI, HIROSHI;MATSUMOTO, SHUNICHI |
发明人 |
ITATANI, HIROSHI;MATSUMOTO, SHUNICHI |
分类号 |
C08L79/08;G03F7/037;G03F7/038;(IPC1-7):G03F7/038;G03F7/004 |
主分类号 |
C08L79/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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