摘要 |
An apparatus for feeding a fluid comprises a deposition head having a main surface, spaced feed ducts arranged on the main surface along a length of the deposition head for feeding the fluid and a channel formed on the main surface and extending at least along entirely the length of the deposition head. The apparatus further comprises a spacer plate slidably supported by the channel so that the spacer plate can be fastened to the main surface at any position along the entire length of the channel. A deposition module is mounted on the spacer plate and has a nozzle in communication with at least one of the feed ducts for depositing the fluid. The apparatus advantageously facilitates reposition of the nozzle with minimal effort.
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