发明名称 |
Thin-film transistor with lightly-doped drain |
摘要 |
There is provided a semiconductor device including a semiconductor circuit formed by semiconductor elements having an LDD structure which has high reproducibility, improves the stability of TFTs and provides high productivity and a method for manufacturing the same.In order to achieve the object, the design of a second mask is appropriately determined in accordance with requirements associated with the circuit configuration to make it possible to form a desired LDD region on both sides or one side of the channel formation region of a TFT.
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申请公布号 |
US6359320(B1) |
申请公布日期 |
2002.03.19 |
申请号 |
US19990387053 |
申请日期 |
1999.08.31 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI SHUNPEI;NAKAJIMA SETSUO;KUWABARA HIDEAKI |
分类号 |
G09F9/33;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):H01L31/113 |
主分类号 |
G09F9/33 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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