发明名称 Split gate flash memory with virtual ground array structure and method of fabricating the same
摘要 The present invention provides a flash memory having a split gate structure and a virtual array structure, wherein a high impurity concentration region of a first conductivity type is provided in a drain adjacent region of a channel region under a floating gate electrode, and the high impurity concentration region has a highest impurity concentration in the channel region, and wherein a low impurity concentration region of a first conductivity type is provided in the channel region but at a part not covered by the floating gate.
申请公布号 US6359303(B1) 申请公布日期 2002.03.19
申请号 US19990414605 申请日期 1999.10.08
申请人 NEC CORPORATION 发明人 KANAMORI KOHJI
分类号 H01L21/8247;H01L27/115;H01L29/423;H01L29/788;H01L29/792;(IPC1-7):H01L29/76 主分类号 H01L21/8247
代理机构 代理人
主权项
地址
您可能感兴趣的专利