发明名称 Cold cathode ion beam deposition apparatus with segregated gas flow
摘要 A cold cathode closed drift ion source is provided with segregated gas flow. A first gas may be caused to flow through or along a path around a peripheral portion of an anode so as to pass through the electric gap between the anode and cathode. A second gas (different from the first gas) may be caused to flow toward the ion emitting slit, without much of the second gas having to pass through the electric gap(s). If it is desired to utilize a gas which produces insulative material (e.g., an organosilicon gas), this gas may be used as the second gas. Accordingly, insulative material buildup in the electric gap between the anode and cathode may be reduced, and changes in beam chemistry can be achieved without unduly altering ion beam characteristics.
申请公布号 US6359388(B1) 申请公布日期 2002.03.19
申请号 US20000649010 申请日期 2000.08.28
申请人 GUARDIAN INDUSTRIES CORP. 发明人 PETRMICHL RUDOLPH HUGO
分类号 C23C14/22;C23C16/44;C23C16/455;C23C16/513;H01J27/14;H01J37/08;H01J37/317;(IPC1-7):H01J7/24 主分类号 C23C14/22
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