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发明名称
CLEANING GAS AND METHOD FOR CLEANING VACUUM TREATMENT APPARATUS BY FLOWING THE CLEANING GAS
摘要
申请公布号
SG87074(A1)
申请公布日期
2002.03.19
申请号
SG20000000105
申请日期
2000.01.11
申请人
CENTRAL GLASS COMPANY, LIMITED;TOKYO ELECTRON LIMITED
发明人
ISAMU MOURI;TETSUYA TAMURA;MITSUYA OHASHI;TADAYUKI KAWASHIMA;MASAHIKO MATSUDO;TATSUO HATANO
分类号
H01L21/302;C23C16/44;C23F1/12;H01L21/205;H01L21/285;H01L21/304;H01L21/3065;H01L21/31;(IPC1-7):C23C16/56;C23C14/58
主分类号
H01L21/302
代理机构
代理人
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地址
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