| 摘要 |
PURPOSE: An apparatus for processing liquid is provided to maintain the high quality of a substrate and to improve production yield, by preventing generation of ascending air current and by preventing mist from being attached to the substrate. CONSTITUTION: A maintenance unit(43) maintains the substrate(G). A process liquid supplying apparatus supplies predetermined process liquid to the substrate. A rotating unit and the maintenance unit rotate the substrate. A buffer chamber(63) stays air current and/or mist generated by the rotation of the substrate, and winds up the air current and/or mist while the air current and/or mist is not diffused to the substrate.
|
