ORGANOSILOXANE POLYMER, PHOTOCURABLE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN AND FILM FOR PROTECTING SUBSTRATE

摘要

PURPOSE: To obtain a new organopolysiloxane producing a photocurable resin composition by light of a wide wavelength range and capable of readily forming a thin film without an influence of oxygen and forming a fine pattern excellent in dry etching resistance, and a cured film obtained from the composition excellent in an adhesion to substrates, heat resistance and electrical insulating properties, and usable as a protective film for electrical and electronic parts, semiconductor elements, etc. CONSTITUTION: This organopolysiloxane-based polymer has a repeating unit represented by the following general formula (1) (wherein, R1 to R4 may be the same or different and denote each a 1-8C monovalent hydrocarbon group; n is an integer of 1-1,000) and further 500-200,000 weight-average molecular weight.