发明名称 CHARGED-PARTICLE BEAM EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an improved charged-particle beam exposure system, in which the state of the irradiation of charged-particle beams can be detected accurately for a prolonged term. SOLUTION: There is a slender cylindrical section 53 at the central section of a reflected-electron detector cover 51. A circular plate-shaped cover plate 55 is fixed at the lower end of the cylindrical section 53. Four square reflected- electron pass holes 55b are formed at the four quarters of the pass hole 55a of electron beams in the cover plate 55 so as to be penetrated. The reflected- electron detector cover 51 is turned by a driving device 65, reflected beams 33 passed through the reflected-electron pass holes 55b are adjusted so as to collide with a reflected-electron detector 22, and the position of a mark is confirmed. The cover 51 is turned by approximately 45 deg. from the position of the mark, the reflected electrons 33 are adjusted so as not to collide with the reflected-electron detector 22, and exposure is conducted.
申请公布号 JP2002075826(A) 申请公布日期 2002.03.15
申请号 JP20000256777 申请日期 2000.08.28
申请人 NIKON CORP 发明人 MORITA KENJI
分类号 G03F7/20;G03F9/00;H01J37/244;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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