发明名称 HETERO JUNCTION BIPOLAR TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a hetero junction bipolar transistor, which has a base layer of GaAsSb, and can realize a high current gain cut-off frequency (fT). SOLUTION: The hetero junction bipolar transistor comprises a collector layer 3 of at least InP, a base layer 4 of p-type GaAsSb, and an n-type layer of group III-V compound semiconductor having a larger band gap than that of the base layer 4, stacked in this order on a semiconductor substrate 1, where the collector layer 3 comprises an undoped InP layer 3c, p-type InP layer, and n-type InP layer, stacked in this order from the base layer 4.
申请公布号 JP2002076012(A) 申请公布日期 2002.03.15
申请号 JP20000254880 申请日期 2000.08.25
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 IKEDA SHIGEAKI
分类号 H01L29/73;H01L21/331;H01L29/205;H01L29/737;(IPC1-7):H01L21/331 主分类号 H01L29/73
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