SURFACE ROUGHENING METHOD OF SILICON SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a rough surface of a silicon substrate which is used for a semiconductor substrate, especially for a solar battery, with excellent efficiency and high tact. SOLUTION: In a surface roughening method of a silicon substrate wherein the surface of a silicon substrate is made rough by dry etching, etching is performed while etching residue is stuck on a surface of the silicon substrate, and the surface is roughened. After that, the etching residue is eliminated.