| 摘要 |
<p>PROBLEM TO BE SOLVED: To enlarge an effective area by preventing a current leakage at a substrate end 1a, related to a method for manufacturing a photovoltaic device where amorphous semiconductor films 2 and 3 are provided on a main surface of a crystal semiconductor substrate 1, over which transparent electrode layers 4 and 5 are provided. SOLUTION: The side surface 1a of the crystal semiconductor substrate 1 is covered with a cover member 10. Then the amorphous semiconductor films 2 and 3 and the transparent electrode layers 4 and 5 are formed.</p> |
