| 摘要 |
PURPOSE: A polymer compound, a chemical amplification-type positive resist composition and a method for forming pattern using the resist composition are provided, to improve transparency, substrate adhesion, alkali developability and acid-elimination capability of the resist composition. CONSTITUTION: The polymer compound comprises at least one repeating unit selected from the group consisting of the repeating units represented by the formulas 1a, 1b and 1c, wherein R is H, an acid unstable group, a linear, branched or cyclic alkyl or fluorinated group of C1-C20, an acyl group or an acyl group containing a fluorinated alkyl group; R1 and R2 are H or F; R3 and R4 are an acid unstable group and an adhesive group, respectively; R5 is a linear, branched or cyclic alkyl group of C1-C20 or a fluorinated alkyl group. The resist composition comprises the polymer compound; an organic solvent; an acid generator; and optionally a basic compound and/or a dissolution inhibitor.
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