| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for detecting an end point depending upon a change in color of an aqueous dispersion for a chemical mechanical polishing or color of polishing waste liquid during polishing, and the aqueous dispersion used for the method. SOLUTION: Depending upon a change in color of the aqueous dispersion for a chemical mechanical polishing on a polishing pad or a change in color of the polishing waste liquid discarded during chemical-mechanical polishing an end point of polishing is detected. The end point can be detected by using the aqueous dispersion containing a coupler has different colors during chemical- mechanical polishing performed on a polished film and after the polishing. When the polished film is a metallic film such as a Cu film, as a coupler, the aqueous dispersion can contain heteropolyacid or its salt that includes silicotungstic acid and phosphotungstic acid, or an organic acid or its salt that has a complex aromatic ring such as quinaldic acid and quinolinic acid. When the polished film is an insulating film such as a silicon dioxide film, the aqueous dispersion can contain a compound which is changed in color according to variation in pH of thymolphthalein, phenolphthalein, and so on. |
