发明名称 METHOD FOR GROWING ZnO OXIDE SEMICONDUCTOR LAYER AND METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT-EMITTING DEVICE USING THE METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for growing a ZnO oxide semiconductor layer which can significantly increase the carrier concentration of a p-type layer in the ZnO oxide semiconductor layer and a method for manufacturing a semiconductor light-emitting device having a superior property of light emission by improving a crystal state of the ZnO oxide. SOLUTION: A material source Zn and O that compose the ZnO oxide, and a dopant source N, which is provided by having nitrogen, i.e., p-type dopant, in plasma state, are supplied so as to make the material source that composes the ZnO oxide rich in Zn, and thereby the p-type ZnO oxide semiconductor layer 9 grows on the substrate 8.
申请公布号 JP2002076026(A) 申请公布日期 2002.03.15
申请号 JP20000256729 申请日期 2000.08.28
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;ROHM CO LTD 发明人 IWATA HIROYA;PAUL FONSU;YAMADA AKIMASA;MATSUBARA KOJI;NIKI SAKAE;NAKAHARA TAKESHI
分类号 H01L21/363;H01L21/365;H01L33/12;H01L33/28;H01S5/347 主分类号 H01L21/363
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