| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure system in which the connection of a complementary pattern does not increase and which does not increase the chromatic aberration of an electronic optical system and to provide a scattering mask, an exposure method, and a semiconductor manufacturing device. SOLUTION: Since a stencil mask manufacturing process and a membrane mask manufacturing process are different from each other, necessary patterns are formed and masks are manufactured by sticking the masks to the same mask frame (support frame). In this way, the mask of an electron beam batch exposure system is constituted of a stencil type 16 and a membrane type 17 as necessary. |
