COLLECTING APPARATUS OF POLISHING MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide a collecting apparatus for collecting reusable polishing materials from discharged water produced in polishing process including polishing material discharged from CMP(Chemical Mechanical Polishing) used in a semiconductor manufacturing plant and the like by effectively collecting polishing particle through highly concentrated operation. SOLUTION: The collecting apparatus for collecting polishing material from discharged water in the CMP process comprises a concentrating section for introducing the discharged water in the CMP process in batch-wise way to concentrate the concentration of the polishing material to the extent of given concentration with filtration film and a washing section for adding washing water to the concentrated water obtained by the concentrating section.