发明名称 METHOD OF HOLDING X-RAY REFLECTING MIRROR, X-RAY EXPOSURE SYSTEM AND MANUFACURING METHOD OF DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of holding an X-ray reflecting mirror in which a method of holding the X-ray reflecting mirror is improved. SOLUTION: The X-ray reflecting mirror 19 is fixed vertically by a holding member 41. The inner diameter of the holding member 41 is made larger than the outer diameter of the X-ray reflecting mirror 19, and there is an opening between the holding member and the reflecting mirror. Three holding sections 43 and 53 are formed towards the central on the interior wall of the holding member 41. Elastic bodies 45 and 55 are annexed to sections brought into contact with the X-ray reflecting mirror 19 at the front ends of the holding sections 43 and 53. The reflecting mirror 19 is held between the vertical line of the center of gravity of the reflecting mirror 19 and a rear (the rear of a reflecting surface), and the bulging deformation of the reflecting surface due to reflecting mirror due to its own weight and the recessed deformation of the reflecting surface due to the warp of the reflecting mirror are offset.
申请公布号 JP2002075831(A) 申请公布日期 2002.03.15
申请号 JP20000258616 申请日期 2000.08.29
申请人 NIKON CORP 发明人 SUGIZAKI KATSUMI
分类号 G21K1/06;G03F7/20;G21K5/02;G21K7/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G21K1/06
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