| 摘要 |
PROBLEM TO BE SOLVED: To provide an illumination system by which a pattern of a reticle can be projected onto a wafer with a high degree of accuracy. SOLUTION: With respect to the illumination system having an optical system which makes a light flux from a light source incident onto a multi-light-flux forming means and a lens system which illuminates a surface to be illuminated by the multiple fluxes formed by the multi-light-flux forming means, the optical system has, from the side of the multi-light-flux forming means in sequence, an illumination optical system and a first light deflecting member provided at the front focal point of the illumination optical system or in its proximity and the multi-light-flux forming means is provided with a light axis of the illumination optical system and a plurality of fine lenses which are placed around the light axis. The first light deflecting member is provided with a plurality of transparent wedges which are rotatable about the light axis of the illumination optical system and the incoming position of the whole light fluxes from the light surface to the multi-light-flux forming means is changed by changing the direction of deflection of the whole light fluxes from the light source by the rotation of the plurality of transparent wedges. |
